An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography-Reference-Cited by-同舟云学术

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An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography

Published:2015-02-12 Issue:4 Volume:23 Page:4482
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Zhang Fang,Zhu Jing,Yue Weirui,Wang Jian,Song Qiang,Situ Guohai,Wyrowski Frank,Huang Huijie

Funder

Chinese Academy of Sciences Visiting Professorship for Senior International Scientist

International Science & Technology Cooperation Program of China

National Natural Science Foundation of China (NSFC)

Recruitment Program for Global Young Experts

Science and Technology Commission of Shanghai Municipality

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference27 articles.

1. Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach

2. Statistic analysis of influence of phase distortion on diffractive optical element for beam smoothing

3. Approach to improve beam quality of inter-satellite optical communication system based on diffractive optical elements

4. Diffractive optical elements for high gain lasers with arbitrary output beam profiles

5. Test of diffractive optical element for DUV lithography system using visible laser

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1. Angle monitor of micromirror array for freeform illumination in lithography systems;AIP Advances;2024-01-01

2. Influence of Front Face Reflectivity on Output Spectral Characteristics of Semiconductor Lasers with Volume Bragg Grating External Cavities;CHIN J LASERS;2023

3. Deep holography;Light: Advanced Manufacturing;2022

4. Design and optimization of top-Gaussian illumination field in photolithography;Optical Engineering;2021-02-26

5. Light-shaping design by a fourier pair synthesis: the homeomorphic case;Optics Express;2021-01-21

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