Design and optimization of top-Gaussian illumination field in photolithography
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Published:2021-02-26
Issue:02
Volume:60
Page:
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ISSN:0091-3286
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Container-title:Optical Engineering
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language:
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Short-container-title:Opt. Eng.
Author:
Ma Xiaozhe1,
Zhang Fang1,
Niu Zhiyuan1,
Huang Huijie1
Affiliation:
1. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Informat
Funder
National Natural Science Foundation of China
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Cited by
1 articles.
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