Illumination Field Uniformity Correction by Novel Finger Arrays for Lithography Illumination System
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Published:2024-07-15
Issue:7
Volume:11
Page:661
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ISSN:2304-6732
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Container-title:Photonics
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language:en
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Short-container-title:Photonics
Author:
Luo Shaoqin1, Liu Junbo23, Jin Chuan2, Zhou Ji2ORCID
Affiliation:
1. School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China 2. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 3. University of Chinese Academy of Sciences, Beijing 100049, China
Abstract
In order to correct the integrated nonuniformity of a lithographic illumination field, a high-precision uniformity correction method for an advanced lithographic illumination system is proposed. The method adopts the opaque finger array structure and improves correction ability and accuracy by optimizing the arrangement and structure of the unit without changing the width of each unit. The correction accuracy is expressed as the percentage of the corrected integrated nonuniformity. Through theoretical analysis and simulation, it can be seen that the correction accuracy of a staggered finger array is better than 0.22%. When staggered and layered, the correction accuracy of a finger array is better than 0.14%, which is better than that of a non-layered finger array. When staggered, layered, and chamfered of each unit, the correction accuracy of the finger array structure is better than 0.12%.
Funder
Sichuan Science and Technology Program National Key Research and Development Plan National Natural Science Foundation of China Youth Innovation Promotion Association of the Chinese Academy of Sciences project of the Western Light of Chinese Academy of Science Sichuan Provincial Regional Innovation Cooperation Project Sichuan Provincial Science Fund for Distinguished Young Scholars
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