Extreme ultraviolet lithography: From research to manufacturing-Reference-Cited by-同舟云学术

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Extreme ultraviolet lithography: From research to manufacturing

Published:2007 Issue:6 Volume:25 Page:2089
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

La Fontaine Bruno,Deng Yunfei,Kim Ryoung-han,Levinson Harry J.,Okoroanyanwu Uzodinma,Sandberg Richard,Wallow Tom,Wood Obert

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016

2. High-intensity nanosecond all-fiber-coiled laser and extreme ultraviolet generation;SPIE Proceedings;2015-03-04

3. Radiation-Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies;ACS Applied Materials & Interfaces;2014-03-13

4. Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers;SPIE Proceedings;2012-04-16

5. Low Energy Xe+Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics;Japanese Journal of Applied Physics;2011-06-20

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