Author:
Sim Woojoo,Lee Kibok,Yang Dingdong,Jeong Jaeseung,Hong Jisuk,Lee Sooryong,Lee Honglak
Reference28 articles.
1. Accurate lithography simulation model based on convolutional neural networks;Watanabe,2017
2. Machine learning-based 3d resist model;Shim,2017
3. Data efficient lithography modeling with residual neural networks and transfer learning;Lin,2018
4. Optical proximity correction using a multilayer perceptron neural network
5. Optical proximity correction with hierarchical Bayes model
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献