High resolution templates for step and flash imprint lithography-Reference-Cited by-同舟云学术

High resolution templates for step and flash imprint lithography

Published:2002-10-01 Issue:3 Volume:1 Page:284
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Resnick D. J.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Step and flash imprint lithography: Template surface treatment and defect analysis

2. Step and flash imprint lithography: a new approach to high-resolution patterning

3. M. Colburn, T. Bailey, B. J. Choi, J. G. Ekerdt, and S. V. Sreenivasan, Solid State Technol.67(June 2001).

4. Plasma etching of Cr: a multiparameter uniformity study utilizing patterns of various Cr loads

5. K. H. Smith, J. R. Wasson, P. J. S. Mangat, W. J. Dauksher, and D. J. Resnick,J. Vac. Sci. Technol. B(to be published).

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoimprinting of Biomimetic Nanostructures;Nanomanufacturing;2022-02-09

2. Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast;International Conference on Extreme Ultraviolet Lithography 2019;2019-09-26

3. EUV-LET 2.0: a compact exposure tool for industrial research at a wavelength of 13.5nm;Extreme Ultraviolet (EUV) Lithography X;2019-03-26

4. Optimized phase-shifting masks for high-resolution resist patterning by interference lithography;International Conference on Extreme Ultraviolet Lithography 2017;2017-10-16

5. Enhanced photo-patterning of polymer dielectrics via imprint lithography;Microelectronic Engineering;2012-05