Silicon containing polymer in applications for 193 nm high NA lithography processes-Reference-Cited by-同舟云学术

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Silicon containing polymer in applications for 193 nm high NA lithography processes

Published:2006-03-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Burns Sean,Pfeiffer Dirk,Mahorowala Arpan,Petrillo Karen,Clancy Alexandera,Babich Katherina,Medeiros David,Allen Scott,Holmes Steven,Crouse Michael,Brodsky Colin,Pham Victor,Lin Yi-Hsiung,Patel Kaushal,Lustig Naftali,Gabor Allen,Sheraw Christopher,Brock Phillip,Larson Carl

Publisher

SPIE

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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