Impact of polymerization process on OOB on lithographic performance of a EUV resist-Reference-Cited by-同舟云学术

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Impact of polymerization process on OOB on lithographic performance of a EUV resist

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Jain Vipul,Coley Suzanne M.,Lee Jung June,Christianson Matthew D.,Arriola Daniel J.,LaBeaume Paul,Danis Maria E.,Ortiz Nicolas,Kang Su-Jin,Wagner Michael D.,Kwok Amy,Valeri David A.,Thackeray James W.

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results;Nanomaterials;2020-08-14

2. Chemically amplified resists and acid amplifiers;Materials and Processes for Next Generation Lithography;2016

3. Terpolymerization of Styrenic Photoresist Polymers: Effect of RAFT Polymerization on the Compositional Heterogeneity;Macromolecules;2015-05-22

4. Understanding EUV resist mottling leading to better resolution and linewidth roughness;SPIE Proceedings;2014-04-17

5. Effect of leaving group design on EUV lithography performance;Extreme Ultraviolet (EUV) Lithography IV;2013-04-01

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