The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations-Reference-Cited by-同舟云学术

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Published:2016-03-15 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Ishida Keisuke,Ohta Takeshi,Miyamoto Hirotaka,Kumazaki Takahito,Tsushima Hiroaki,Kurosu Akihiko,Matsunaga Takashi,Mizoguchi Hakaru

Publisher

SPIE

Reference7 articles.

1. High Power Injection Lock 6kHz 60W Laser for ArF Dry/Wet Lithography;Mizoguchi,2006

2. Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool;Suzuki,2007

3. High-power and high-energy stability injection lock laser light source for double exposure or double pattering ArF immersion lithography;Yoshino,2008

4. Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography;Tsushima,2009

5. Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography;Yoshino,2010

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