Accuracy optimization with wavelength tunability in overlay imaging technology-Reference-Cited by-同舟云学术

Accuracy optimization with wavelength tunability in overlay imaging technology

Published:2018-03-13 Issue: Volume: Page:
ISSN:
Container-title:Metrology, Inspection, and Process Control for Microlithography XXXII
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Author:

Honggoo Lee,Aharon Sharon,Ben-Dov Guy,Golotsvan Anna,Klein Dana,Marciano Tal,Saltoun Lilach,Kang Yoonshik,Shim Kyuchan,Hong Minhyung,Han Sangjun,Kim Seungyoung,Lee Jieun,Lee Dongyoung,Oh Eungryong,Choi Ahlin,Kim Youngsik,Hajaj Eitan,Serero Dan

Publisher

SPIE

Reference6 articles.

1. Optimized Overlay Metrology Marks: Theory and Experiment

2. Multilayer overlay metrology;Ausschnitt,2006

3. Performance study of new segmented overlay marks for advanced wafer processing;Adel,2003

4. Characterization of overlay mark fidelity;Adel,2003

5. Microlithography

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