Author:
Khusnatdinov Niyaz,Ye Zhengmao,Luo Kang,Stachowiak Tim,Lu Xiaoming,Irving J. W.,Shafran Matt,Longsine Whitney,Traub Matthew,Truskett Van,Fletcher Brian,Liu Weijun,Xu Frank,LaBrake Dwayne,Sreenivasan S. V.
Reference14 articles.
1. Nanoimprint lithography
2. Pattern transfer to silicon by microcontact printing and RIE
3. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE, Emerging Lithographic Technologies III, 379 (1999).
4. M. Colburn, T. Bailey, B. J. Choi, J. G. Ekerdt, S. V. Sreenivasan, Solid State Technology, 67, June 2001.
5. Template fabrication schemes for step and flash imprint lithography
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