Development of EB inspection system EBeyeM for EUV mask-Reference-Cited by-同舟云学术

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Development of EB inspection system EBeyeM for EUV mask

Published:2010-09-30 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Hirano Takashi,Yamaguchi Shinji,Naka Masato,Itoh Masamitsu,Kadowaki Motoki,Koike Tooru,Yamazaki Yuuichiro,Terao Kenji,Hatakeyama Masahiro,Sobukawa Hiroshi,Murakami Takeshi,Tsukamoto Kiwamu,Hayashi Takehide,Watanabe Kenji,Kimura Norio,Hayashi Naoya

Publisher

SPIE

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. EUV multilayer defect characterization via cycle-consistent learning;Optics Express;2020-06-05

2. Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer;Photomask Technology 2019;2019-09-29

3. DUV inspection beyond optical resolution limit for EUV mask of hp 1X nm;Photomask Technology;2017-10-16

4. Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-06-24

5. Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system;SPIE Proceedings;2016-05-10

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