Imaging properties of a patterned rough surface: effects of roughness correlation and partial coherence
Author:
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference18 articles.
1. Nonspecular x-ray scattering in a multilayer-coated imaging system
2. Fabrication and testing of optics for EUV projection lithography
3. Effects of mask roughness and condenser scattering in EUVL systems
4. Effects of object roughness on partially coherent image formation
5. Observation of speckle patterns in extreme ultraviolet imaging
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Predicting LER PSD caused by mask roughness using a mathematical model;SPIE Proceedings;2014-04-17
2. Recovering effective amplitude and phase roughness of EUV masks;SPIE Proceedings;2013-09-23
3. Mathematical model for calculating speckle contrast through focus;Extreme Ultraviolet (EUV) Lithography IV;2013-04-01
4. Study on the surface roughness of substrate with multi-fractal spectrum;Microelectronic Engineering;2007-05
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