Observation of speckle patterns in extreme ultraviolet imaging-Reference-Cited by-同舟云学术

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Observation of speckle patterns in extreme ultraviolet imaging

Published:2001 Issue:6 Volume:19 Page:2406
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Solak H. H.,Yang Y.,Cerrina F.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Direct Ion Beam Figuring Process and Rotational Measurement Method for Ultra-smooth Aspherical Surfaces of a 46.5 nm Telescope;Research in Astronomy and Astrophysics;2023-10-11

2. Effects of Flare on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists;Japanese Journal of Applied Physics;2009-09-24

3. System-level line-edge roughness limits in extreme ultraviolet lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008

4. Imaging properties of a patterned rough surface: effects of roughness correlation and partial coherence;Optical Engineering;2005-07-01

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