Efficient global sensitivity analysis for silicon line gratings using polynomial chaos-Reference-Cited by-同舟云学术

Efficient global sensitivity analysis for silicon line gratings using polynomial chaos

Published:2019-06-21 Issue: Volume: Page:
ISSN:
Container-title:Modeling Aspects in Optical Metrology VII
language:
Short-container-title:

Author:

Farchmin Nando,Hammerschmidt Martin,Schneider Philipp-Immanuel,Wurm Matthias,Bär Markus,Heidenreich Sebastian

Publisher

SPIE

Reference18 articles.

1. Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring;Hsu;Thin Solid Films,2004

2. Importance measures in global sensitivity analysis of nonlinear models

3. Variance based sensitivity analysis of model output. Design and estimator for the total sensitivity index

4. Global sensitivity analysis using polynomial chaos expansions

5. Quantifying parameter uncertainties in optical scatterometry using bayesian inversion;Hammerschmidt,2017

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. PyThia: A Python package for Uncertainty Quantification based on non-intrusive polynomial chaos expansions;Journal of Open Source Software;2023-09-15

2. Neural network assisted multi-parameter global sensitivity analysis for nanostructure scatterometry;Applied Surface Science;2021-12

3. Theoretical Investigation on New Analyzing Procedure of Anelastic Strain Recovery Method for Stress Measurements based on Bayesian Statistical Modeling;Journal of the Society of Materials Science, Japan;2021-07-15

4. Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry;Measurement Science and Technology;2020-07-13