1. Resist Materials and Processes for Extreme Ultraviolet Lithography
2. Novel EUV resist materials and process for 20 nm half pitch and beyond;Maruyama,2013
3. EUV resist materials design for 15 nm half pitch and below;Tsubaki,2013
4. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning;Chakrabarty,2013
5. Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond;Ekinci,2013