Removal Analysis of Residual Photoresist Particles Based on Surface Topography Affected by Exposure Times of Ultraviolet and Developer Solution-Reference-Cited by-同舟云学术

Removal Analysis of Residual Photoresist Particles Based on Surface Topography Affected by Exposure Times of Ultraviolet and Developer Solution

Published:2022-12-15 Issue:51 Volume:38 Page:16134-16143
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Park Jinwon¹^ORCID,Lee Jaehong¹^ORCID,Han Seongsoo²^ORCID,Lee Hyun-Ro¹^ORCID,Choi Siyoung Q.¹³^ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea

2. Mineral Processing and Metallurgy Research Center, Resources Utilization Division, Korea Institute of Geoscience and Mineral Resources (KIGAM), Daejeon 34132, Korea

3. KAIST Institute for the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea

Funder

Samsung

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c02882

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