Mask strategy and layout decomposition for self-aligned quadruple patterning-Reference-Cited by-同舟云学术

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Mask strategy and layout decomposition for self-aligned quadruple patterning

Published:2013-03-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Kang Weiling,Feng Chen,Chen Yijian

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mandrel/spacer engineering-based patterning and metallization incorporating metal layer division and rigorously self-aligned vias and cuts (SAVC);Advanced Etch Technology and Process Integration for Nanopatterning XIII;2024-04-09

2. A Gridless Approach to the Satisfiability of Self-Aligned Triple Patterning;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2017-08

3. Defect inspection and printability study for 14 nm node and beyond photomask;SPIE Proceedings;2016-10-05

4. Cut-hole layout decomposition and synthesis to reduce the effect of edge-placement errors;Microelectronic Engineering;2016-04

5. Layout decomposition and synthesis for a modular technology to solve the edge-placement challenges by combining selective etching, direct stitching, and alternating-material self-aligned multiple patterning processes;SPIE Proceedings;2016-03-16

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