1. Mask strategy and layout decomposition for self-aligned quadruple patterning;Kang,2013
2. Defectivity Study on Extreme Ultraviolet Mask;Seki,2015
3. Evaluation of the accuracy of complex illuminator designs;Hibbs,2011
4. Your worst nightmare: inspection of aggressive OPC on 14nm masks with emphasis on defect sensitivity and wafer defect print predictability;Badger,2013
5. From nightmares to sweet dreams: inspection of aggressive OPC on 14nm reticles (and beyond) using a novel high-NA and low-NA dual method;Badger,2015