Author:
Fenger Germain L.,Armeanu Ana-Maria,Philipsen Vicky,Jiang Fan,Lafferty Neal,Hendrickx Eric,Sturtevant John,Gillijns Werner
Reference10 articles.
1. Novel EUV mask absorber evaluation in support of next-generation EUV imaging;Philipsen,2018
2. Reducing EUV mask 3D effects by alternative metal absorbers
3. Attenuated PSM for EUV: Can they mitigate 3D mask effects?
4. Practical DTCO Through Design/Patterning Exploration;Lafferty,2015
5. Actinic characterization and modeling of the EUV mask stack;Philipsen,2013
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献