High NA EUV scanner: obscuration and wavefront description-Reference-Cited by-同舟云学术

High NA EUV scanner: obscuration and wavefront description

Published:2020-11-18 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet Lithography 2020
language:
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Author:

de Winter Laurens,Tudorovskiy Timur,van Schoot Jan,Troost Kars,Stinstra Erwin,Hsu Stephen,Gruner Toralf,Mueller Juergen,Mack Ruediger,Bilski Bartosz,Zimmermann Joerg,Graeupner Paul

Publisher

SPIE

Reference25 articles.

1. Anamorphic high-NA EUV lithography optics

2. High-NA EUV lithography exposure tool progress

3. Impact of lens aberrations on optical lithography

4. Toward a comprehensive control of full-field image quality in optical photolithography

5. Impact of wavefront errors on low k1 processes at extreme high NA;Gräupner,2003

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