Electron-beam mask writer EBM-6000 for 45 nm HP node-Reference-Cited by-同舟云学术

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Electron-beam mask writer EBM-6000 for 45 nm HP node

Published:2007-05-03 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yashima Jun,Ohtoshi Kenji,Nakayamada Noriaki,Anze Hirohito,Katsumata Takehiko,Iijima Tomohiro,Nishimura Rieko,Fukutome Syuuichiro,Miyamoto Nobuo,Wake Seiji,Sakai Yusuke,Sakamoto Shinji,Hara Shigehiro,Higurashi Hitoshi,Hattori Kiyoshi,Saito Kenichi,Kendall Rodney,Tamamushi Shuichi

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The mask contribution as part of the intra-field on-product overlay performance;Photomask Technology 2020;2020-10-12

2. MDP challenges from a software provider's perspective;SPIE Proceedings;2014-10-08

3. Nanoimprint lithography and future patterning for semiconductor devices;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-10-01

4. Process liability evaluation for extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-10-01

5. Process liability evaluation for EUVL;Alternative Lithographic Technologies;2009-03-13

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