Process liability evaluation for EUVL-Reference-Cited by-同舟云学术

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Process liability evaluation for EUVL

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies
language:
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Author:

Aoyama Hajime,Tawarayama Kazuo,Tanaka Yuusuke,Kawamura Daisuke,Arisawa Yukiyasu,Uno Taiga,Kamo Takashi,Tanaka Toshihiko,Itani Toshiro,Tanaka Hiroyuki,Nakajima Yumi,Inanami Ryoichi,Takai Kosuke,Murano Koji,Koshiba Takeshi,Hashimoto Kohji,Mori Ichiro

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of practical flare correction tool for full chip in EUV lithography;SPIE Proceedings;2012-03-29

2. Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics;Japanese Journal of Applied Physics;2011-06-20

3. Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics;Japanese Journal of Applied Physics;2011-06-01

4. Development status of EUV resist materials and processing at Selete;SPIE Proceedings;2011-03-17

5. Resolution Enhancement for Beyond-22-nm Node Using Extreme Ultraviolet Exposure Tool;Japanese Journal of Applied Physics;2010-06-21

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