Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference23 articles.
1. Impact of EUV light scatter on CD control as a result of mask density changes
2. Development progress of optics for extreme ultraviolet lithography at Nikon
3. Contrast transfer function measurements of deep ultraviolet steppers
4. Effects of flare in extreme ultraviolet lithography: Learning from the engineering test stand
5. Evaluation of shadowing and flare effect for EUV tool
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