Fabrication and characterization of W/B4C lamellar multilayer grating and NbC/Si multilayer phase-shift reflector-Reference-Cited by-同舟云学术

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Fabrication and characterization of W/B4C lamellar multilayer grating and NbC/Si multilayer phase-shift reflector

Published:2017-08-23 Issue: Volume: Page:
ISSN:
Container-title:Advances in X-Ray/EUV Optics and Components XII
language:
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Author:

Bhartiya S.,Singh A.,Majhi A.,Gome A.,Dhawan R.,Nayak M.,Sahoo Pratap K.,Rai S. K.,Reddy V. R.,Pradhan Paresh C.

Publisher

SPIE

Reference22 articles.

1. Multilayer mirror technology for soft-x-ray projection lithography

2. Multilayer facilities required for extreme-ultraviolet lithography

3. Pradhan, P.C., D. Majhi, A. Nayak, and Modi, M.H., “Soft X-ray performance of W/B4C multilayer mirrors in the energy range 650 eV to 1500 eV,” Opt. Lett., To be submitted.

4. Fabrication and performance of a high resolution ultra-short period W/B4C multilayer structure

5. A single W/B_4C transmission multilayer for polarization analysis of soft x-rays up to 1keV

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental study and modeling of extreme ultraviolet 4000 lines/mm diffraction gratings coated with periodic and aperiodic Al/Mo/SiC multilayers;Applied Optics;2023-12-21

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