Stencil masks for electron-beam projection lithography-Reference-Cited by-同舟云学术

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Stencil masks for electron-beam projection lithography

Published:2001-09-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Kurihara Kenji,Iriguchi H.,Motoyoshi A.,Tabata T.,Takahashi S.,Iwamoto K.,Okada Ikuo,Yoshihara Hideo,Noguchi Hitoshi

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental analysis of image placement accuracy of single-membrane masks for LEEPL;SPIE Proceedings;2005-06-28

2. Masks for Electron Beam Projection Lithography;Handbook of Photomask Manufacturing Technology;2005-04-07

3. Analysis of Organic Contamination Adsorbed on a Silicon Surface in a Vacuum Chamber in Electron Beam Lithography;Journal of The Electrochemical Society;2005

4. Practical LEEPL masks for sub-65-nm node;SPIE Proceedings;2004-12-06

5. Resolution-limiting factors in low-energy electron-beam proximity projection lithography: Mask, projection, and resist process;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004

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