Mandrel-based patterning: density multiplication techniques for 15nm nodes-Reference-Cited by-同舟云学术

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Mandrel-based patterning: density multiplication techniques for 15nm nodes

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Bencher Chris,Dai Huixiong,Miao Liyan,Chen Yongmei,Xu Ping,Chen Yijian,Oemardani Shiany,Sweis Jason,Wiaux Vincent,Hermans Jan,Chang Li-Wen,Bao Xinyu,Yi He,Wong H.-S. Philip

Publisher

SPIE

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Line edge roughness reduction for EUV self-aligned double patterning by surface modification on spin-on-carbon and tone inversion technique;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-06-17

2. Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features;Extreme Ultraviolet (EUV) Lithography XI;2020-04-06

3. Inverse lithography OPC correction with multiple patterning and etch awareness;Optical Microlithography XXXI;2018-03-20

4. 3D memory: etch is the new litho;Advanced Etch Technology for Nanopatterning VII;2018-03-20

5. Fabrication of sub-20 nm patterns using dopamine chemistry in self-aligned double patterning;Nanoscale;2018

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