GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

Author:

Zable Harold1,Matsumoto Hironobu2,Yasui Kenichi2,Ueba Ryosuke2,Nakayamada Noriaki2,Shirali Nagesh1,Masuda Yukihiro1,Pearman Ryan1,Fujimura Aki1

Affiliation:

1. D2S, Inc. (United States)

2. NuFlare Technology, Inc. (Japan)

Publisher

SPIE

Reference8 articles.

1. Multi-Beam Mask Writer MBM-1000 and its Application Field;Matsumoto,2016

2. Improving CD uniformity using MB-MDP for 14nm node and beyond;Kim,2012

3. The Resurgence of ILT;Cecil;presented at eBeam Initiative meeting,2017

4. eBeam Initiative, “2016 eBeam Initiative Mask Maker Survey Results,” (Sept. 12, 2016)

5. The Challenges in Making NIL Master Templates;Hayashi;eBeam Initiative,2016

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4. Recent progress and future of electron multi-beam mask writer;Japanese Journal of Applied Physics;2023-02-17

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