Lithography simulation in semiconductor manufacturing
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SPIE
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix;Optics Communications;2019-01
2. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations;Acta Optica Sinica;2018
3. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination;Journal of the Optical Society of America A;2016-05-13
4. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image;Applied Optics;2016-04-13
5. Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-10-20
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