Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging-Reference-Cited by-同舟云学术

Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging

Published:2015-10-20 Issue:4 Volume:14 Page:043504
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Shen Lina¹,Li Sikun²,Wang Xiangzhao²,Yan Guanyong²

Affiliation:

1. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, ChinabXinjiang Normal University, Institute of Physics and Electronic Engineering, Xinjiang, Ur

2. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai 201800, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. How to describe polarization influence on imaging

2. Polarization aberration modeling via Jones matrix in the context of OPC

3. Optimization procedure of exposure tools with polarization aberrations

4. Polarization aberration analysis in optical lithography systems

5. Polarization aberration analysis using Pauli-Zernike representation

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