Focus effects in submicron optical lithography, part 4: metrics for depth of focus
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SPIE
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Evaluating the probabilistic process window for use in high volume manufacturing;Metrology, Inspection, and Process Control XXXVIII;2024-04-10
2. Probabilistic process window: a new approach to focus-exposure analysis;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-01-31
3. Probabilistic process window: a new approach to focus-exposure analysis;Metrology, Inspection, and Process Control XXXVI;2022-05-26
4. Impact of partial coherence on the apparent optical transfer function derived from the response to amplitude edges;Applied Optics;2017-04-19
5. Optical and EUV projection lithography: A computational view;Microelectronic Engineering;2015-01
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