Author:
Mack Chris A.,Yannuzzi Jonathan,Lorusso Gian F.,Zidan Mohamed,De Simone Danilo,Weldeslassie Ataklti,Vandenbroeck Nadia,Foubert Philippe,Beral Christophe,Charley Anne-Laure
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Convolutional Neural Network (CNN) Based Process Window Analysising for Lithography;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
2. Probabilistic process window: a new approach to focus-exposure analysis;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-01-31