Author:
Mack Chris A.,Yannuzzi Jonathan,Lorusso Gian F.,Zidan Mohamed,De Simone Danilo,Weldeslassie Ataklti,Vandenbroeck Nadia,Foubert Philippe,Beral Christophe,Charley Anne-Laure
Cited by
1 articles.
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1. Probabilistic process window: a new approach to focus-exposure analysis;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-01-31