Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography-Reference-Cited by-同舟云学术

Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography

Published:2011-07-01 Issue:3 Volume:10 Page:033012
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Mehrotra Prateek

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. International Technology Roadmap for Semiconductors (ITRS) (2010).

2. B. W. Smith, Y. F. Fan, J. M. Zhou, N. Lafferty, and A. Estroff , inOptical Microlithography XIX, Parts 1–3, D. G. Flagello , Ed., Vol. 6154, pp. U200–U208, SPIE Advanced Lithography, San Jose, CA (2006).

3. Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer

4. B. W. Smith and J. Cashmore , inOptical Microlithography XV, Parts 1 and 2, A. Yen , Ed., Vol. 4691, pp. 11–24, SPIE Advanced Lithography, San Jose, CA (2002).

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1. Reflective metamaterial polarizer enabled by solid-immersion Lloyd's mirror interference lithography;Journal of Vacuum Science & Technology B;2019-11

2. Plasmonic Lithography: Recent Progress;Advanced Optical Materials;2019-05-02

3. Wavefront aberration of plane diffraction gratings fabricated in a Lloyd’s mirror interferometer;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-05-22

4. Solid immersion optical lithography: index matching and resonant reflectors for large exposure field, high-aspect ratio imaging in the ultrahigh-numerical aperture regime;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-12-21

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