Solid immersion optical lithography: index matching and resonant reflectors for large exposure field, high-aspect ratio imaging in the ultrahigh-numerical aperture regime-Reference-Cited by-同舟云学术

Solid immersion optical lithography: index matching and resonant reflectors for large exposure field, high-aspect ratio imaging in the ultrahigh-numerical aperture regime

Published:2015-12-21 Issue:4 Volume:14 Page:043510
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Lowrey Sam¹,Blaikie Richard¹

Affiliation:

1. University of Otago, Department of Physics, Sub-wavelength Optics Group, 730 Cumberland Street, Dunedin 9054, New ZealandbVictoria University of Wellington, MacDiarmid Institute for Advanced Materials and Nanotechnology, PO Box 600, Wellington 6140, New Z

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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1. Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs;Nanomaterials;2020-05-13

2. Reflective metamaterial polarizer enabled by solid-immersion Lloyd's mirror interference lithography;Journal of Vacuum Science & Technology B;2019-11

3. Plasmonic Lithography: Recent Progress;Advanced Optical Materials;2019-05-02

4. Tunable Antireflection Coating to Remove Index‐Matching Requirement for Interference Lithography;Advanced Optical Materials;2018-02-23

5. Novel prism designs for solid immersion optical lithography in the ultra high-NA regime;International Journal of Nanotechnology;2018