Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. International Technology Roadmap for Semiconductors (2005).
2. High-performance circuit design for the RET-enabled 65-nm technology node
3. Performance optimization for gridded-layout standard cells
4. Investigation of viable approaches to AAPSM intensity imbalance reduction for 65nm lithography
5. B. Lin , “Lithography for manufacturing of sub-65 nm node and beyond,” presented at theInternational Electron Devices Meeting, San Francisco, pp. 48–51 (2005).
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