Actinic review of EUV masks: performance data and status of the AIMS EUV System-Reference-Cited by-同舟云学术

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Actinic review of EUV masks: performance data and status of the AIMS EUV System

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Hellweg Dirk¹,Perlitz Sascha¹,Magnusson Krister¹,Capelli Renzo¹,Koch Markus¹,Malloy Matt²

Affiliation:

1. Carl Zeiss SMT GmbH (Germany)

2. SUNY Poly SEMATECH (United States)

Publisher

SPIE

Reference5 articles.

1. Repair of natural EUV reticle defects;Jonckheere,2011

2. Actinic Review of EUV Masks;Feldmann,2010

3. Actinic review of EUV masks: First results from the AIMS™ EUV system integration;Weiss,2014

4. Actinic review of EUV masks: Status and recent results of the AIMSTM EUV system;Weiss,2015

5. Assessment of AIMS™ EUV and SHARP actinic wavelength mask defect review tools for the evaluation of blank defect printability;Verduijn,2015

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Actinic patterned mask imaging using extreme ultraviolet ptychography microscope with high harmonic generation source;Applied Physics Express;2022-06-17

2. Improved ptychographic inspection of EUV reticles via inclusion of prior information;Applied Optics;2020-07-06

3. EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-17

4. EUV vote-taking lithography: crazy... or not?;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19

5. Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production;Photomask Technology;2017-10-16

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