EUV vote-taking lithography: crazy... or not?-Reference-Cited by-同舟云学术

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EUV vote-taking lithography: crazy... or not?

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Bekaert Joost,Hendrickx Eric,van de Kerkhof Mark A.,Kupers Michiel,Schiffelers Guido,Verduijn Erik,Brunner Timothy A.,De Bisschop Peter,Beral Christophe,Bouten Sander

Publisher

SPIE

Reference21 articles.

1. Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner;van de Kerkhof,2017

2. EUV for HVM: NXE3400B performance;van Es,2018

3. EUV Lithography: From the Very Beginning to the Eve of Manufacturing;Yen,2016

4. EUV progress toward HVM readiness;Turkot,2016

5. Overcoming EUV mask blank defects: what we can, and what we should;Jonckheere,2017

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dual monopole exposure strategy to improve extreme ultraviolet imaging;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-07-01

2. Defect repairs for the extreme ultraviolet mask;Extreme Ultraviolet (EUV) Lithography XII;2021-02-21

3. Stochastic printing failures in extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-25

4. Edge placement error fundamentals and impact of EUV: will traditional design-rule calculations work in the era of EUV?;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-24

5. EUV photoresist patterning characterization for imec N7/N5 technology;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19

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