<title>Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing

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Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing

Published:2001-08-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Mahorowala Arpan P.,Babich Katherina,Petrillo Karen E.,Simons John P.,Angelopoulos Marie,Patel Vishnubhai,Grill Alfred,Halle Scott,Conti Richard,Wu ChungHsi J.,Wise Richard,Chen Linda,Thomas Alan C.,Lee B.,Genz Oliver

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A comparison of alignment and overlay performance with varying hardmask materials;SPIE Proceedings;2012-03-29

2. Overlay metrology for dark hard mask process: simulation and experiment study;SPIE Proceedings;2007-03-16

3. Silicon containing polymer in applications for 193 nm high NA lithography processes;SPIE Proceedings;2006-03-10

4. Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004

5. Impact of thin resist processes on post-etch LER;Advances in Resist Technology and Processing XX;2003-06-11

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