Improvements to the analytical linescan model for SEM metrology

Author:

Mack Chris A.1,Bunday Benjamin D.2

Affiliation:

1. Lithoguru.com (United States)

2. SUNY Poly SEMATECH (United States)

Publisher

SPIE

Reference15 articles.

1. Monte Carlo modeling of secondary electron imaging in three dimensions;Villarrubia,2007

2. Sensitivity of scanning electron microscope width measurements to model assumptions

3. Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library

4. Simulation study of repeatability and bias in the critical dimension scanning electron microscope;Villarrubia,2005

5. Gaps Analysis for CD Metrology Beyond the 22 nm Node;Bunday,2013

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