Unbiased roughness measurements from low signal-to-noise ratio SEM images-Reference-Cited by-同舟云学术

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Unbiased roughness measurements from low signal-to-noise ratio SEM images

Published:2022-05-26 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control XXXVI
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Author:

Mack Chris A.,Severi Joren,Zidan Mohamed,De Simone Danilo,Lorusso Gian F.

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extreme UV self-aligned double patterning process optimization for BEOL interconnections on 3nm nodes and beyond;Advanced Etch Technology and Process Integration for Nanopatterning XIII;2024-04-09

2. Deep learning denoiser assisted roughness measurements extraction from thin resists with low signal-to-noise-ratio (SNR) SEM Images: analysis with SMILE;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

3. Unbiased roughness measurements from low signal-to-noise ratio scanning electron microscope images;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-14

4. Scaling and readiness of underlayers for high-NA EUV lithography;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

5. Extraction of roughness measurements from thin resists with low signal-to-noise-ratio (SNR) SEM images by applying deep learning denoiser;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

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