Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry-Reference-Cited by-同舟云学术

Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry

Published:2015-04-10 Issue:2 Volume:14 Page:021102
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Dixit Dhairya J.¹,Kamineni Vimal²,Farrell Richard²,Hosler Erik R.²,Preil Moshe³,Race Joseph⁴,Peterson Brennan⁴,Diebold Alain C.¹

Affiliation:

1. College of Nanoscale Science & Engineering, 257 Fuller Road, Albany, New York 12203, United States

2. GLOBALFOUNDRIES U.S. Inc., 255 Fuller Road, Suite 280, Albany, New York 12203, United States

3. GLOBALFOUNDRIES U.S. Inc., 1050 Arques Avenue, Sunnyvale, California 94085, United States

4. Nanometrics, 1550 Buckeye Drive, Milpitas, California 95035, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Fabrication of 28nm pitch Si fins with DSA lithography

2. Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics

3. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features

4. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mueller matrix spectroscopic ellipsometry;Advanced Optical Technologies;2022-06-07

2. Metrology;2021 IEEE International Roadmap for Devices and Systems Outbriefs;2021-11

3. Establishment and verification of sub-aperture scanning Fourier transform system for scattered light measurements;Optics Communications;2021-01

4. Extracting dimensional parameters of gratings produced with self-aligned multiple patterning using grazing-incidence small-angle x-ray scattering;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-01-28

5. Nanoscale limits of angular optical scatterometry;AIP Advances;2020-01-01