Practical proof of CP element based design for 14nm node and beyond-Reference-Cited by-同舟云学术

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Practical proof of CP element based design for 14nm node and beyond

Published:2013-03-26 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies V
language:
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Author:

Maruyama Takashi,Takita Hiroshi,Ikeno Rimon,Osawa Morimi,Kojima Yoshinori,Sugatani Shinji,Hoshino Hiromi,Hino Toshio,Ito Masaru,Iizuka Tetsuya,Komatsu Satoshi,Ikeda Makoto,Asada Kunihiro

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Line-edge quality optimization of electron beam resist for high-throughput character projection exposure utilizing atomic force microscope analysis;SPIE Proceedings;2017-04-04

2. Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-09-08

3. Electron-beam lithography with character projection exposure for throughput enhancement with line-edge quality optimization;SPIE Proceedings;2016-03-16

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