Collapse behavior of single layer 193- and 157-nm resists: use of surfactants in the rinse to realize the sub-130-nm nodes-Reference-Cited by-同舟云学术

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Collapse behavior of single layer 193- and 157-nm resists: use of surfactants in the rinse to realize the sub-130-nm nodes

Published:2002-07-15 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Hien Stefan,Rich Georgia K.,Molina Gilbert,Cao Heidi B.,Nealey Paul F.

Publisher

SPIE

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