1. A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties
2. Revisit Pattern Collapse for 14nm Node and Beyond;Kenji,2011
3. Understanding Pattern Collapse in High-Resolution Lithography: Impact of Feature Width on Critical Stress;Noga,2009
4. Effect of the rinse solution to avoid 193 nm resist line collapse: A study for modification of resist polymer and process conditions;Seiya,2004
5. Collapse behavior of single layer 193 and 157 nm resists: Use of surfactants in the rinse to realize the sub 130 nm nodes;Hiena,2002