A study of ILT-based curvilinear SRAF with a constant width-Reference-Cited by-同舟云学术

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A study of ILT-based curvilinear SRAF with a constant width

Published:2022-12-01 Issue: Volume: Page:
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Container-title:Photomask Technology 2022
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Author:

Xu Yan,Hou Jiechang,Zeggaoui Nassima,Sun Yuyang,Lei Junjiang

Publisher

SPIE

Reference4 articles.

1. ILT for HVM: history, present and future;Peng,2022

2. Inverse lithography technology: 30 years from concept to practical, full-chip reality;Pang,2021

3. Constraint approaches for some inverse lithography problems with pixel-based mask;Kobelkov,2018

4. Fast pixel-based mask optimization for inverse lithography

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inverse Lithography with Structured Sub-Resolution Assist Features;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

2. Fast full chip curvilinear MRC for advanced manufacturing nodes;DTCO and Computational Patterning III;2024-04-10

3. A study of applying mask process correction to constant width curvilinear SRAFS;Photomask Technology 2023;2023-11-21

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