Key components development progress updates of the 250W high-power LPP-EUV light source-Reference-Cited by-同舟云学术

Key components development progress updates of the 250W high-power LPP-EUV light source

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Ueno Yoshifumi,Hori Tsukasa,Kawasuji Yasufumi,Shiraishi Yutaka,Yanagida Tatsuya,Miyao Kenichi,Hayashi Hideyuki,Ishii Takuya,Watanabe Yukio,Okamoto Takeshi,Abe Tamotsu,Kodama Takeshi,Nakarai Hiroaki,Yamazaki Taku,Itou Noritoshi,Saitou Takashi,Mizoguchi Hakaru

Publisher

SPIE

Reference35 articles.

1. !EUV lithography;Bakshi,2009

2. Performance overview and outlook of EUV lithography systems;Pirati,2015

3. First generation laser-produced plasma source system for HVM EUV lithography;Mizoguchi,2010

4. Laser produced EUV light source development for HVM;Endo,2007

5. 100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Physics and Applications of Superintense and Ultrafast Lasers;CHIN J LASERS;2024

2. Study on 100 kHz Repetitive Frequency Tin Droplet Targets;LASER OPTOELECTRON P;2023

3. Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source;Applied Physics Express;2020-10-15

4. Characterization of radiative and kinetic properties of laser produced plasmas for efficient extreme ultraviolet nanolithography sources;Journal of Applied Physics;2019-10-28

5. EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology;Applied Sciences;2019-07-15