Characterization of radiative and kinetic properties of laser produced plasmas for efficient extreme ultraviolet nanolithography sources
Author:
Affiliation:
1. Center for Materials Under Extreme Environment (CMUXE), College of Engineering, Purdue University, West Lafayette, Indiana 47907, USA
Funder
Office of International Science and Engineering
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.5111863
Reference21 articles.
1. Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography
2. Performance of one hundred watt HVM LPP-EUV source
3. Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources
4. Plasma Propulsion of a Metallic Microdroplet and its Deformation upon Laser Impact
5. Temporally and spatially resolved ion dynamics of droplet-based laser-produced tin plasmas in lateral expansion direction
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1. Experimental study of the dynamics and extreme ultraviolet radiation of laser produced colliding Sn plasmas;Physics of Plasmas;2024-04-01
2. Joint measurement of electron density, temperature, and emission spectrum of Nd:YAG laser-produced tin plasma;Applied Physics Letters;2023-11-13
3. Timing jitter of monodisperse droplets generated by capillary jet breakup;Physics of Fluids;2022-04
4. Enhancing the conversion efficiency of extreme ultraviolet light sources using a 2 µm wavelength laser;Plasma Physics and Controlled Fusion;2021-12-16
5. Dynamics of laser produced plasma from foam targets for future nanolithography devices and X-ray sources;Scientific Reports;2021-07-01
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