Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources

Author:

Tomita Kentaro,Sato Yuta,Tsukiyama Syouichi,Eguchi Toshiaki,Uchino Kiichiro,Kouge Kouichiro,Tomuro Hiroaki,Yanagida Tatsuya,Wada Yasunori,Kunishima Masahito,Soumagne Georg,Kodama Takeshi,Mizoguchi Hakaru,Sunahara Atsushi,Nishihara Katsunobu

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Reference33 articles.

1. Tallents, G., Wagenaars, E. & Pert, G. Optical lithography: Lithography at EUV wavelengths. Nature Photonics 4, 809–811 (2010).

2. Stamm, U. et al. High-power EUV lithography sources based on gas discharges and laser-produced plasmas. Proc. SPIE 5037, Emerg. Lithogr. Technol. VII5037, 5037–119 (2003).

3. Mizoguchi, H. et al. LPP-EUV light source development for high volume manufacturing lithography, Proc. SPIE 867986790A (2013).

4. Tanaka, H. et al. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas. Appl. Phys. Lett. 87, 5–8 (2005).

5. Ueno, Y. et al. Enhancement of extreme ultraviolet emission from a CO2 laser-produced Sn plasma using a cavity target. Appl. Phys. Lett. 91, 231501 (2007).

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