100W 1st generation laser-produced plasma light source system for HVM EUV lithography-Reference-Cited by-同舟云学术

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100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Mizoguchi Hakaru,Abe Tamotsu,Watanabe Yukio,Ishihara Takanobu,Ohta Takeshi,Hori Tsukasa,Yanagida Tatsuya,Nagano Hitoshi,Yabu Takayuki,Nagai Shinji,Soumagne Georg,Kurosu Akihiko,Nowak Krzysztof M.,Suganuma Takashi,Moriya Masato,Kakizaki Kouji,Sumitani Akira,Kameda Hidenobu,Nakarai Hiroaki,Fujimoto Junichi

Publisher

SPIE

Cited by 36 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development progress of Gigaphoton’s LPP EUV light source for inspection systems;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Smart Optical Inline Metrology;Recent Advances in Microelectronics Reliability;2024

3. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07

4. Numerical modeling of droplet rim fragmentation by laser-pulse impact using a multiscale two-fluid approach;Physical Review Fluids;2022-10-20

5. Key technology development progress of the high power LPP-EUV light source;Optical and EUV Nanolithography XXXV;2022-05-26

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