Level crossing methodology applied to line-edge roughness characterization
Author:
Affiliation:
1. Fractilia (United States)
2. GLOBALFOUNDRIES Inc. (United States)
Publisher
SPIE
Reference15 articles.
1. Analytical expression for impact of linewidth roughness on critical dimension uniformity
2. Understanding the efficacy of linewidth roughness postprocessing
3. Line Edge Roughness (LER) performance targets for EUV Lithography;Brunner,2017
4. Mathematical Analysis of Random Noise;Rice,1954
5. Roughness spectrum and surface width of self-affine fractal surfaces via the K-correlation model
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23
2. Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-06-14
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